We propose a statistical method to predict the dark random readout noise in CMOS image sensors. First, we calculate the dark random noise originated from oxide traps present in the source-follower MOSFET. Statistical variation in the dark noise is associated with the random variation of the oxide defects in the CMOS image sensor cells in both the energy and space domain. Considering the effect of the correlated double sampling, we define the dark random noise as the standard deviation in the time domain and analyze the effect of the MOSFET width and length variations and temperature on its dark random noise.
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